Chemistry

Radiation Imagery Chemistry: Process, Composition, Or Product Thereof

Radiation Mask

No:5576142

2-hydroxybenzophenone uv dyes for laser recording process

No:7056629

2n mask design for sequential lateral solidification

No:6517983

Aberration estimating mask pattern

No:5939226

Aberration estimation reticle for determining overlay error

No:6437858

Aberration measuring method, aberration measuring system and aberration measuring mask

No:6908714

Absorber layer for euv

No:6641959

Absorberless phase-shifting mask for euv

No:4621042

Absorptive planarizing layer for optical lithography

No:7288344

Accommodating diffraction in the printing of features on a substrate

No:7435514

Active mask lithography

No:7014956

Active secondary exposure mask to manufacture integrated circuits

No:6841308

Adjustable transmission phase shift mask

No:7067223

Adjustable transmission phase shift mask

No:4895780

Adjustable windage method and mask for correction of proximity effect in submicron photolithography

No:7460209

Advanced mask patterning with patterning layer

No:5863677

Aligner and patterning method using phase shift mask

No:5532091

Aligning method

No:7245351

Alignment mark for coarse alignment and fine alignment of a semiconductor wafer in an exposure tool

No:5264310

Alignment mark having regions formed by energy beam irradiation therein and method of manufacturing the same

No:5849441

Alignment method utilizing plurality of marks, discriminable from each other, capable of effecting alignment individually

No:6610448

Alignment method, overlay deviation inspection method and photomask

No:6493065

Alignment system and alignment method in exposure apparatus

No:5663016

All-polymeric phase shift masks

No:6553560

Alleviating line end shortening in transistor endcaps by extending phase shifters

No:6872496

Alsixoy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography

No:6933084

Alternating aperture phase shift photomask having light absorption layer

No:6759171

Alternating aperture phase shifting photomask with improved intensity balancing

No:6780548

Alternating aperture phase shifting photomask with improved transmission balancing

No:6986972

Alternating aperture phase-shift mask fabrication method

No:6680151

Alternating phase mask

No:6998204

Alternating phase mask built by additive film deposition

No:6977127

Alternating phase shift mask

No:6416909

Alternating phase shift mask and method for fabricating the alignment monitor

No:7229722

Alternating phase shift mask design for high performance circuitry

No:6927005

Alternating phase shift mask design with optimized phase shapes

No:6846596

Alternating phase shift masking for multiple levels of masking resolution

No:6582858

Alternating phase shifting mask

No:6187480

Alternating phase-shifting mask

No:6852455

Amorphous carbon absorber/shifter film for attenuated phase shift mask

No:6004703

Amplitude mask and apparatus for manufacturing long period grating filter using the same

No:6447959

Amplitude mask for writing long-period gratings

No:7122280

Angular substrates

No:5304460

Anisotropic conductor techniques

No:7387855

Anti-esd photomask blank

No:7384714

Anti-reflective sidewall coated alternating phase shift mask and fabrication method

No:7145721

Anti-reflective structures

No:4927692

Antistatic mask for use with electronic test apparatus

No:5520297

Aperture plate and a method of manufacturing the same

No:7379170

Apparatus and method for characterizing an image system in lithography projection tool

No:6313905

Apparatus and method for defining a pattern on a substrate