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Chemistry / Radiation Imagery Chemistry: Process, Composition, Or Product Thereof / Radiation Mask


Co-linear and intersecting five light beam generator

Co-linear and intersecting five light beam generator

Conformal photolithographic method and mask for manufacturing parts with patterned curved surfaces

Conformal photolithographic method and mask for manufacturing parts with patterned curved surfaces

System for ablative imaging by proximity lithography

System for ablative imaging by proximity lithography

Process for detecting defects in photomasks through aerial image comparisons

Process for detecting defects in photomasks through aerial image comparisons

Mechanisms for making and inspecting reticles

Mechanisms for making and inspecting reticles

Method of manufacturing a thin-film pattern on a substrate

Method of manufacturing a thin-film pattern on a substrate

Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same

Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same

Methods for microdispensing patterened layers

Methods for microdispensing patterened layers

Method for forming a fine resist pattern

Method for forming a fine resist pattern

Method of defining the dimensions of circuit elements by using spacer deposition techniques

Method of defining the dimensions of circuit elements by using spacer deposition techniques

Method of making masks for phase shifting lithography

Method of making masks for phase shifting lithography

Mask for photolithography

Mask for photolithography

Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process

Process for manufacturing semiconductor integrated circuit device, exposure method and mask for the process

Phase shift photomask and method of producing same

Phase shift photomask and method of producing same

Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering

Methods of forming half-tone phase-shift masks with reduced susceptiblity to parasitic sputtering

Mixed mode photomask for nikon stepper

Mixed mode photomask for nikon stepper

Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

Electron device manufacturing method, a pattern forming method, and a photomask used for those methods

Two-sided mask for patterning of materials with electromagnetic radiation

Two-sided mask for patterning of materials with electromagnetic radiation

Scattering reticle for electron beam systems

Scattering reticle for electron beam systems

Charged particle beam transfer method

Charged particle beam transfer method

Method of making phase-shifting lithographic masks

Method of making phase-shifting lithographic masks

Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same

Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same

Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device

Photo-mask, photo-mask pair, semiconductor device and method of manufacturing a semiconductor device

Manufacturing method of photomask and photomask

Manufacturing method of photomask and photomask

Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization

Comparing aerial image to SEM of photoresist or substrate pattern for masking process characterization

Pattern exposure/transfer method and pattern exposure/transfer mask apparatus

Pattern exposure/transfer method and pattern exposure/transfer mask apparatus

Maskless 2-D and 3-D pattern generation photolithography

Maskless 2-D and 3-D pattern generation photolithography

Photolithographic dose determination by diffraction of latent image grating

Photolithographic dose determination by diffraction of latent image grating

Monitoring of minimum features on a substrate

Monitoring of minimum features on a substrate

Monitoring of minimum features on a substrate

Monitoring of minimum features on a substrate

Micro-surface fabrication process

Micro-surface fabrication process

Positioning method and apparatus

Positioning method and apparatus

Method of making and using a high resolution lithographic mask

Method of making and using a high resolution lithographic mask

Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass

Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass

Suppression of side-lobe printing by shape engineering

Suppression of side-lobe printing by shape engineering

Method for repairing a pattern

Method for repairing a pattern

Ion beam induced deposition of metals

Ion beam induced deposition of metals

Attenuating phase shift photomasks

Attenuating phase shift photomasks

Attenuating phase shift photomasks

Attenuating phase shift photomasks

Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus

Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus

Projection-microlithography mask with separate mask substrates

Projection-microlithography mask with separate mask substrates

Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure

Photodeposition method for fabricating a three-dimensional, patterned polymer microstructure

Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same

Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same

Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer

Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer

Blank for halftone phase shift photomask and halftone phase shift photomask

Blank for halftone phase shift photomask and halftone phase shift photomask

Phase shift mask blank, phase shift mask and method of manufacture

Phase shift mask blank, phase shift mask and method of manufacture

Phase shift mask and manufacturing the same

Phase shift mask and manufacturing the same

Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM

Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM

Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate

Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate

Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor

Method for manufacturing semiconductor integrated circuit device, optical mask used therefor, method for manufacturing the same, and mask blanks used therefor

Dry development process for a bi-layer resist system utilized to reduce microloading

Dry development process for a bi-layer resist system utilized to reduce microloading


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